Nejnovější publikace

  • Hibino, K; Olejnicek, J; Yamanoi, K; Ponseca, CS Jr; Shuaib, A; Maruyama, Y; Pisarikova, A; Kohout, M; Cada, M; Kapran, A; Akabe, Y; Sarukura, N; Hubicka, Z; Ono, S; Cadatal-Raduban, M: Impact of electron cyclotron wave resonance plasma on defect reduction in ZnO thin films, Sci Rep 15 (1) 5555 (2025).
    DOI: 10.1038/s41598-025-88921-5.
  • Písaríková, A; Krysová, H; Kapran, A; Písarík, P; Cada, M; Olejnícek, J; Hippler, R; Hubicka, Z: Semiconductor WO<sub>3</sub> thin films deposited by pulsed reactive magnetron sputtering, Mater. Sci. Semicond. Process 186 109034 (2025).
    DOI: 10.1016/j.mssp.2024.109034.
  • Kapran, A; Hippler, R; Wulff, H; Olejnicek, J; Volfova, L; Pisarikova, A; Nepomniashchaia, N; Cada, M; Hubicka, Z: Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O<sub>2</sub> Gas Mixture, Coatings 14 (3) 319 (2024).
    DOI: 10.3390/coatings14030319.
  • Pisariková, A; Olejnícek, J; Venkrbcová, I; Nozka, L; Cichon, S; Azinfar, A; Hippler, R; Helm, CA; Maslán, M; Machala, L; Hubicka, Z: CuFeO<sub>2</sub> prepared by electron cyclotron wave resonance-assisted reactive HiPIMS with two magnetrons and radio frequency magnetron sputtering, J. Vac. Sci. Technol. A 41 (6) 63005 (2023).
    DOI: 10.1116/6.0002902.
  • Kapran, A; Hippler, R; Wulff, H; Olejnicek, J; Pisarikova, A; Cada, M; Hubicka, Z: Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films, Vacuum 215 112272 (2023).
    DOI: 10.1016/j.vacuum.2023.112272.
  • Kapran, A; Hippler, R; Wulff, H; Olejnicek, J; Pisarikova, A; Cada, M; Hubicka, Z: Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films, Vacuum 215 112272 (2023).
    DOI: 10.1016/j.vacuum.2023.112272.