Nejnovější publikace

  • Hibino, K; Olejnicek, J; Yamanoi, K; Ponseca, CS Jr; Shuaib, A; Maruyama, Y; Pisarikova, A; Kohout, M; Cada, M; Kapran, A; Akabe, Y; Sarukura, N; Hubicka, Z; Ono, S; Cadatal-Raduban, M: Impact of electron cyclotron wave resonance plasma on defect reduction in ZnO thin films, Sci Rep 15 (1) 5555 (2025).
    DOI: 10.1038/s41598-025-88921-5.
  • Písaríková, A; Krysová, H; Kapran, A; Písarík, P; Cada, M; Olejnícek, J; Hippler, R; Hubicka, Z: Semiconductor WO<sub>3</sub> thin films deposited by pulsed reactive magnetron sputtering, Mater. Sci. Semicond. Process 186 109034 (2025).
    DOI: 10.1016/j.mssp.2024.109034.
  • Kapran, A; Hippler, R; Wulff, H; Olejnicek, J; Volfova, L; Pisarikova, A; Nepomniashchaia, N; Cada, M; Hubicka, Z: Crystalline Structure and Optical Properties of Cobalt Nickel Oxide Thin Films Deposited with a Pulsed Hollow-Cathode Discharge in an Ar+O<sub>2</sub> Gas Mixture, Coatings 14 (3) 319 (2024).
    DOI: 10.3390/coatings14030319.
  • Kapran, A; Hippler, R; Wulff, H; Olejnicek, J; Pisarikova, A; Cada, M; Hubicka, Z: Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films, Vacuum 215 112272 (2023).
    DOI: 10.1016/j.vacuum.2023.112272.
  • Kapran, A; Hippler, R; Wulff, H; Olejnicek, J; Pisarikova, A; Cada, M; Hubicka, Z: Characteristics of a pulsed hollow cathode discharge operated in an Ar+O2 gas mixture and deposition of copper nickel oxide thin films, Vacuum 215 112272 (2023).
    DOI: 10.1016/j.vacuum.2023.112272.
  • Hrubantova, A; Hippler, R; Wulff, H; Cada, M; Gedeon, O; Jiricek, P; Houdkova, J; Olejnicek, J; Nepomniashchaia, N; Helm, CA; Hubicka, Z: Copper tungsten oxide (CuxWOy) thin films for optical and photoelectrochemical applications deposited by reactive high power impulse magnetron co-sputtering, J. Appl. Phys. 132 (21) 215301 (2022).
    DOI: 10.1063/5.0123075.
  • Hrubantova, A; Hippler, R; Wulff, H; Cada, M; Olejnicek, J; Nepomniashchaia, N; Helm, CA; Hubicka, Z: Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates, J. Vac. Sci. Technol. A 40 (6) 63402 (2022).
    DOI: 10.1116/6.0002012.
  • Tvarog, D; Olejnicek, J; Kratochvil, J; Ksirova, P; Poruba, A; Hubicka, Z; Cada, M: Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma, J. Appl. Phys. 130 (1) 13301 (2021).
    DOI: 10.1063/5.0046829.
  • Sezemsky, P; Stranak, V; Kratochvil, J; Cada, M; Hippler, R; Hrabovsky, M; Hubicka, Z: Modified high frequency probe approach for diagnostics of highly reactive plasma, Plasma Sources Sci. Technol. 28 (11) 115009 (2019).
    DOI: 10.1088/1361-6595/ab506c.
  • Olejnicek, J; Brunclikova, M; Kment, S; Hubicka, Z; Kmentova, H; Ksirova, P; Cada, M; Zlamal, M; Krysa, J: WO3 thin films prepared by sedimentation and plasma sputtering, Chem. Eng. J. 318 , 281 - 288 (2017).
    DOI: 10.1016/j.cej.2016.09.083.
  • Kmentova, H; Kment, S; Wang, LY; Pausoya, S; Vaclayu, T; Kuzel, R; Han, H; Hubicka, Z; Zlamal, M; Olejnicek, J; Cada, M; Krysa, J; Zboril, R: Photoelectrochemical and structural properties of TiO2 nanotubes and nanorods grown on FTO substrate: Comparative study between electrochemical anodization and hydrothermal method used for the nanostructures fabrication, Catal. Today 287 , 130 - 136 (2017).
    DOI: 10.1016/j.cattod.2016.10.022.
  • Kment, S; Cada, M; Hubicka, Z; Krysa, J; Kmentova, H; Olejnicek, J; Cilava, ZZ; Zboril, R: Role of ion bombardment, film thickness and temperature of annealing on PEC activity of very-thin film hematite photoanodes deposited by advanced magnetron sputtering, Int. J. Hydrog. Energy 41 (27) , 11547 - 11557 (2016).
    DOI: 10.1016/j.ijhydene.2015.12.199.
  • Wang, L; Lee, CY; Kirchgeorg, R; Liu, N; Lee, K; Kment, S; Hubicka, Z; Krysa, J; Olejnicek, J; Cada, M; Zboril, R; Schmuki, P: Anodic self-organized transparent nanotubular/porous hematite films from Fe thin-films sputtered on FTO and photoelectrochemical water splitting, Res. Chem. Intermed. 41 (12) , 9333 - 9341 (2015).
    DOI: 10.1007/s11164-015-2021-6.
  • Kment, S; Schmuki, P; Hubicka, Z; Machala, L; Kirchgeorg, R; Liu, N; Wang, L; Lee, K; Olejnicek, J; Cada, M; Gregora, I; Zboril, R: Photoanodes with Fully Controllable Texture: The Enhanced Water Splitting Efficiency of Thin Hematite Films Exhibiting Solely (110) Crystal Orientation, ACS Nano 9 (7) , 7113 - 7123 (2015).
    DOI: 10.1021/acsnano.5b01740.
  • Kment, S; Hubicka, Z; Krysa, J; Sekora, D; Zlamal, M; Olejnicek, J; Cada, M; Ksirova, P; Remes, Z; Schmuki, P; Schubert, E; Zboril, R: On the improvement of PEC activity of hematite thin films deposited by high-power pulsed magnetron sputtering method, Appl. Catal. B-Environ. 165 , 344 - 350 (2015).
    DOI: 10.1016/j.apcatb.2014.10.015.
  • Kment, S; Hubicka, Z; Krysa, J; Olejnicek, J; Cada, M; Gregora, I; Zlamal, M; Brunclikova, M; Remes, Z; Liu, N; Wang, L; Kirchgeorg, R; Lee, CY; Schmuki, P: High-power pulsed plasma deposition of hematite photoanode for PEC water splitting, Catal. Today 230 , 8 - 14 (2014).
    DOI: 10.1016/j.cattod.2013.11.045.
  • Olejnicek, J; Smid, J; Cada, M; Kment, S; Churpita, O; Ksirova, P; Brunclikova, M; Adamek, P; Kohout, M; Valvoda, V; Chvostova, D; Zlamal, M; Hubicka, Z: ZnO thin films prepared by surfatron produced discharge, Catal. Today 230 , 119 - 124 (2014).
    DOI: 10.1016/j.cattod.2013.11.024.
  • Adamek, P; Olejnicek, J; Cada, M; Kment, S; Hubicka, Z: Time-resolved tunable diode laser absorption spectroscopy of pulsed plasma, Opt. Lett. 38 (14) , 2428 - 2430 (2013).
    DOI: 10.1364/OL.38.002428.